Abstract

Scanning Dammann lithography (SDL) is proposed and implemented, which uses a Dammann grating to generate multiple beams with sharp step boundary for writing large-sized gratings efficiently. One of the most attractive advantages is that this technique can accelerate the writing speed, e.g. 1 × 32 Dammann grating can be 32 times faster than the single laser scanning system. More importantly, the uniformity of the multi-beams-written lines is much better than the single laser beam scanning system in consideration of the environmental effects such as air turbulence, thermal instability, etc. Using the SDL system, a three-port high-efficiency beam splitter at visible wavelengths is fabricated quickly, and the theoretical and experimental diffraction efficiencies are both higher than 90%. Therefore, SDL should be a useful tool for fabrication of large-sized gratings.

© 2014 Chinese Optics Letters

PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription