Abstract

We describe a fast method to evaluate the far-field profile of a generic planar disposition of plasmonic gratings and slit apertures, based on the ideal decomposition of the structure into a linear array of distinct scattering elements and provided an accurate description of their plasmonic and radiating behaviors. This approach allows for a fast calculation of the irradiation diagram, and has general validity for any kind of surface defects and for multiple set of gratings and slit apertures.

© 2015 Optical Society of America

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