Abstract

An approach to treating experimental reflectometry and ellipsometry data for bulk samples covered by an overlayer is suggested. This approach can be used for measurement of optical constants of solids, characterization of overlayers, and probing the abruptness of the spatial distribution of a bulk dielectric function. Numerical simulation shows that in the soft-x-ray and extreme-UV ranges the method can be applied for overlayers up to 3–8 nm thick.

© 2000 Optical Society of America

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