Abstract

We report on a single-shot micropatterning of an organic polymer achieved by ablation with demagnifying projection using a Ne-like Zn 21.2nm soft x-ray laser. A nickel mesh with a period of 100μm was 10× demagnified and imprinted on poly(methyl methacrylate) via direct ablation. The quality of the ablated microstructure was found to be mainly dependent on the quality of the projected mask. This first demonstration (to our knowledge) of single-shot projection, single-step lithography illustrates the potential of soft x-ray lasers for the direct patterning of materials with a resolution scalable down to submicrometer domain.

© 2008 Optical Society of America

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