Abstract

The pattern-integrated interference lithography (PIIL) technique combines multi-beam interference lithography (MBIL) and imaging to produce functional periodic-lattice-based microstructures in a rapid single-exposure step. A photonic-crystal waveguide structure with sub-micron resolution is designed, fabricated by PIIL, and characterized. Scanning electron and atomic force microscope images are found to be in good qualitative agreement with three-dimensional simulations of the developed photoresist.

© 2015 Optical Society of America

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