Abstract

Tailored 3D microparticles and nanostructures lead to increasing possibilities in semiconductor industry or biomedical applications. In an interdisciplinary study we investigate the parallel production of such particles by using nanoimprint lithography in combination with their characterization based on interference microscopy. In this Letter we report on a metrological inspection, which tends to a universal measurement solution comparing the sample optically to a master object produced in the same way as the sample.

© 2019 Optical Society of America

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