Abstract

In this study, we investigated whether the optical and electrical properties of indium tin oxide (ITO) films are degraded under laser irradiation below their laser ablation threshold. While performing multi-pulse laser damage experiments on a single ITO film (4.7 ns, 1064 nm, 10 Hz), we examined the optical and electrical properties in situ. A decrease in reflectance was observed prior to laser damage initiation. However, under sub-damage threshold irradiation, conductivity and reflectance of the film were maintained without measurable degradation. This indicates that ITO films in optoelectronic devices may be operated below their lifetime laser damage threshold without noticeable performance degradation.

© 2017 Optical Society of America

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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
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    [Crossref]
  25. H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
    [Crossref]
  26. J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).
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    [Crossref]
  29. A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).
  30. S. Z. Xiao, E. L. Gurevich, and A. Ostendorf, “Incubation effect and its influence on laser patterning of ITO thin film,” Appl. Phys. Adv. Mater. 107, 333–338 (2012).
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    [Crossref]
  32. C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
    [Crossref] [PubMed]
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  34. C. Wang, H. I. Wang, W. T. Tang, C. W. Luo, T. Kobayashi, and J. Leu, “Superior local conductivity in self-organized nanodots on indium-tin-oxide films induced by femtosecond laser pulses,” Opt. Express 19(24), 24286–24297 (2011).
    [Crossref] [PubMed]

2017 (1)

2016 (1)

2015 (2)

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

J. Wallace, “Four 800 kW laser-diode arrays to pump high-pulse-rate HAPLS petawatt laser,” Laser Focus World 51, 15–16 (2015).

2014 (1)

K. Shinoda, T. Nakajima, and T. Tsuchiya, “In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of a low-temperature fabrication process,” Appl. Surf. Sci. 292, 1052–1058 (2014).
[Crossref]

2012 (4)

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

S. Z. Xiao, E. L. Gurevich, and A. Ostendorf, “Incubation effect and its influence on laser patterning of ITO thin film,” Appl. Phys. Adv. Mater. 107, 333–338 (2012).

K. Ellmer, “Past achievements and future challenges in the development of optically transparent electrodes,” Nat. Photonics 6(12), 809–816 (2012).
[Crossref]

C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
[Crossref] [PubMed]

2011 (2)

C. Wang, H. I. Wang, W. T. Tang, C. W. Luo, T. Kobayashi, and J. Leu, “Superior local conductivity in self-organized nanodots on indium-tin-oxide films induced by femtosecond laser pulses,” Opt. Express 19(24), 24286–24297 (2011).
[Crossref] [PubMed]

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

2010 (1)

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

2008 (1)

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
[Crossref]

2006 (2)

J. H. Kim, K. A. Jeon, G. H. Kim, and S. Y. Lee, “Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition,” Appl. Surf. Sci. 252(13), 4834–4837 (2006).
[Crossref]

H. Han, J. W. Mayer, and T. L. Alford, “Band gap shift in the indium-tin-oxide films on polyethylene napthalate after thermal annealing in air,” J. Appl. Phys. 100(8), 083715 (2006).
[Crossref]

2005 (2)

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

T. Minami, “Transparent conducting oxide semiconductors for transparent electrodes,” Semicond. Sci. Technol. 20(4), S35–S44 (2005).
[Crossref]

2004 (4)

M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasui, “Characteristics of indium tin oxide thin films prepared using electron beam evaporation,” Thin Solid Films 447-448, 115–118 (2004).
[Crossref]

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
[Crossref]

A. Ben-Yakar and R. L. Byer, “Femtosecond laser ablation properties of borosilicate glass,” J. Appl. Phys. 96(9), 5316–5323 (2004).
[Crossref]

2002 (1)

C. G. Granqvist and A. Hultaker, “Transparent and conducting ITO films: new developments and applications,” Thin Solid Films 411(1), 1–5 (2002).
[Crossref]

2001 (1)

J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).

2000 (1)

M. J. Alam and D. C. Cameron, “Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process,” Thin Solid Films 377-378, 455–459 (2000).
[Crossref]

1999 (1)

A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).

1995 (1)

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
[Crossref]

1986 (2)

S. Naseem and T. J. Coutts, “The Influence of Deposition Parameters on the Optical and Electrical-Properties of Rf-Sputter-Deposited Indium Tin Oxide-Films,” Thin Solid Films 138(1), 65–70 (1986).
[Crossref]

P. Radhakrishnan, K. Sathianandan, and N. Subhash, “Laser-Induced Damage to Spray Pyrolysis Deposited Transparent Conducting Films,” J. Appl. Phys. 59(3), 902–904 (1986).
[Crossref]

1983 (1)

N. Subhash and K. Sathianandan, “Laser-Induced Damage to Transparent Conducting SnO2 Films at 1062 nm,” J. Appl. Phys. 54(1), 423–424 (1983).
[Crossref]

1982 (1)

1981 (1)

P. C. Karulkar and M. E. Mccoy, “Dc Magnetron Sputter Deposition of Indium Tin Oxide-Films,” Thin Solid Films 83(2), 259–260 (1981).
[Crossref]

1979 (1)

W. T. Pawlewicz, I. B. Mann, W. H. Lowdermilk, and D. Milam, “Laser-Damage-Resistant Transparent Conductive Indium Tin Oxide Coatings,” Appl. Phys. Lett. 34(3), 196–198 (1979).
[Crossref]

1957 (1)

W. G. Spitzer and H. Y. Fan, “Determination of Optical Constants and Carrier Effective Mass of Semiconductors,” Phys. Rev. 106(5), 882–890 (1957).
[Crossref]

Adams, J. J.

Adurodija, F. O.

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

Afshar, M.

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

Alam, M. J.

M. J. Alam and D. C. Cameron, “Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process,” Thin Solid Films 377-378, 455–459 (2000).
[Crossref]

Alford, T. L.

H. Han, J. W. Mayer, and T. L. Alford, “Band gap shift in the indium-tin-oxide films on polyethylene napthalate after thermal annealing in air,” J. Appl. Phys. 100(8), 083715 (2006).
[Crossref]

Ashkenasi, D.

A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).

Asia, I. O.

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

Awwal, A.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Bass, I. L.

Belo, G. S.

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
[Crossref]

Ben-Yakar, A.

A. Ben-Yakar and R. L. Byer, “Femtosecond laser ablation properties of borosilicate glass,” J. Appl. Phys. 96(9), 5316–5323 (2004).
[Crossref]

Bertoti, I.

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
[Crossref]

Bonse, J.

J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).

Borden, M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Bruning, R.

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

Brunton, G.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Bude, J.

S. Elhadj, J. H. Yoo, R. A. Negres, M. G. Menor, J. J. Adams, N. Shen, D. A. Cross, I. L. Bass, and J. Bude, “Optical damage performance of conductive widegap semiconductors: spatial, temporal, and lifetime modeling,” Opt. Mater. Express 7(1), 202–212 (2017).
[Crossref]

J. H. Yoo, M. G. Menor, J. J. Adams, R. N. Raman, J. R. Lee, T. Y. Olson, N. Shen, J. Suh, S. G. Demos, J. Bude, and S. Elhadj, “Laser damage mechanisms in conductive widegap semiconductor films,” Opt. Express 24(16), 17616–17634 (2016).
[Crossref] [PubMed]

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Budge, T.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Byer, R. L.

A. Ben-Yakar and R. L. Byer, “Femtosecond laser ablation properties of borosilicate glass,” J. Appl. Phys. 96(9), 5316–5323 (2004).
[Crossref]

Cameron, D. C.

M. J. Alam and D. C. Cameron, “Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process,” Thin Solid Films 377-378, 455–459 (2000).
[Crossref]

Cantelli, V.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Carey, P. G.

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
[Crossref]

Choi, R.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Christensen, K.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
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Chung, W.

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
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Coutts, T. J.

S. Naseem and T. J. Coutts, “The Influence of Deposition Parameters on the Optical and Electrical-Properties of Rf-Sputter-Deposited Indium Tin Oxide-Films,” Thin Solid Films 138(1), 65–70 (1986).
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Cross, D. A.

da Silva, B. J. P.

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
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da Silva, E. F.

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
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de Azevedo, W. M.

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
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de Vasconcelos, E. A.

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
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Demos, S. G.

DiNicola, J. M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
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Dixit, S.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
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K. Ellmer, “Past achievements and future challenges in the development of optically transparent electrodes,” Nat. Photonics 6(12), 809–816 (2012).
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W. G. Spitzer and H. Y. Fan, “Determination of Optical Constants and Carrier Effective Mass of Semiconductors,” Phys. Rev. 106(5), 882–890 (1957).
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Feili, D.

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

Franks, M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
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Geretovszky, Z.

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
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Granqvist, C. G.

C. G. Granqvist and A. Hultaker, “Transparent and conducting ITO films: new developments and applications,” Thin Solid Films 411(1), 1–5 (2002).
[Crossref]

Gurevich, E. L.

S. Z. Xiao, E. L. Gurevich, and A. Ostendorf, “Incubation effect and its influence on laser patterning of ITO thin film,” Appl. Phys. Adv. Mater. 107, 333–338 (2012).

Han, H.

H. Han, J. W. Mayer, and T. L. Alford, “Band gap shift in the indium-tin-oxide films on polyethylene napthalate after thermal annealing in air,” J. Appl. Phys. 100(8), 083715 (2006).
[Crossref]

Haynam, C.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Heebner, J.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Henesian, M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
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Hermann, M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
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Huang, L. X.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Huang, Z. M.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Hultaker, A.

C. G. Granqvist and A. Hultaker, “Transparent and conducting ITO films: new developments and applications,” Thin Solid Films 411(1), 1–5 (2002).
[Crossref]

Hunter, S.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Ide-Ektessabi, A.

M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasui, “Characteristics of indium tin oxide thin films prepared using electron beam evaporation,” Thin Solid Films 447-448, 115–118 (2004).
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Ishihara, T.

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

Izumi, H.

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

Jeon, K. A.

J. H. Kim, K. A. Jeon, G. H. Kim, and S. Y. Lee, “Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition,” Appl. Surf. Sci. 252(13), 4834–4837 (2006).
[Crossref]

Jeong, J. K.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Ji, K. H.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
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Jung, H. Y.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Kantor, Z.

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
[Crossref]

Karulkar, P. C.

P. C. Karulkar and M. E. Mccoy, “Dc Magnetron Sputter Deposition of Indium Tin Oxide-Films,” Thin Solid Films 83(2), 259–260 (1981).
[Crossref]

Kautek, W.

J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).

Kim, G. H.

J. H. Kim, K. A. Jeon, G. H. Kim, and S. Y. Lee, “Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition,” Appl. Surf. Sci. 252(13), 4834–4837 (2006).
[Crossref]

Kim, J. H.

J. H. Kim, K. A. Jeon, G. H. Kim, and S. Y. Lee, “Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition,” Appl. Surf. Sci. 252(13), 4834–4837 (2006).
[Crossref]

Kim, J. I.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Klotzer, M.

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

Kobayashi, T.

Kolitsch, A.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Konig, K.

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

Kruger, J.

J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).

Laude, L. D.

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
[Crossref]

Lee, J. R.

Lee, S.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Lee, S. Y.

J. H. Kim, K. A. Jeon, G. H. Kim, and S. Y. Lee, “Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition,” Appl. Surf. Sci. 252(13), 4834–4837 (2006).
[Crossref]

Leu, J.

C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
[Crossref] [PubMed]

C. Wang, H. I. Wang, W. T. Tang, C. W. Luo, T. Kobayashi, and J. Leu, “Superior local conductivity in self-organized nanodots on indium-tin-oxide films induced by femtosecond laser pulses,” Opt. Express 19(24), 24286–24297 (2011).
[Crossref] [PubMed]

Li, Y. L.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Liu, J. M.

Lorenz, M.

A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).

Lowdermilk, W. H.

W. T. Pawlewicz, I. B. Mann, W. H. Lowdermilk, and D. Milam, “Laser-Damage-Resistant Transparent Conductive Indium Tin Oxide Coatings,” Appl. Phys. Lett. 34(3), 196–198 (1979).
[Crossref]

Luo, C. W.

C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
[Crossref] [PubMed]

C. Wang, H. I. Wang, W. T. Tang, C. W. Luo, T. Kobayashi, and J. Leu, “Superior local conductivity in self-organized nanodots on indium-tin-oxide films induced by femtosecond laser pulses,” Opt. Express 19(24), 24286–24297 (2011).
[Crossref] [PubMed]

Luo, F.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Luo, Y. Q.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Mann, I. B.

W. T. Pawlewicz, I. B. Mann, W. H. Lowdermilk, and D. Milam, “Laser-Damage-Resistant Transparent Conductive Indium Tin Oxide Coatings,” Appl. Phys. Lett. 34(3), 196–198 (1979).
[Crossref]

Marley, E.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Mayer, J. W.

H. Han, J. W. Mayer, and T. L. Alford, “Band gap shift in the indium-tin-oxide films on polyethylene napthalate after thermal annealing in air,” J. Appl. Phys. 100(8), 083715 (2006).
[Crossref]

McCarty, K.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Mccoy, M. E.

P. C. Karulkar and M. E. Mccoy, “Dc Magnetron Sputter Deposition of Indium Tin Oxide-Films,” Thin Solid Films 83(2), 259–260 (1981).
[Crossref]

Menor, M. G.

Milam, D.

W. T. Pawlewicz, I. B. Mann, W. H. Lowdermilk, and D. Milam, “Laser-Damage-Resistant Transparent Conductive Indium Tin Oxide Coatings,” Appl. Phys. Lett. 34(3), 196–198 (1979).
[Crossref]

Miller, P.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Minami, T.

T. Minami, “Transparent conducting oxide semiconductors for transparent electrodes,” Semicond. Sci. Technol. 20(4), S35–S44 (2005).
[Crossref]

Moller, W.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Monticelli, M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Nakajima, T.

K. Shinoda, T. Nakajima, and T. Tsuchiya, “In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of a low-temperature fabrication process,” Appl. Surf. Sci. 292, 1052–1058 (2014).
[Crossref]

Naseem, S.

S. Naseem and T. J. Coutts, “The Influence of Deposition Parameters on the Optical and Electrical-Properties of Rf-Sputter-Deposited Indium Tin Oxide-Films,” Thin Solid Films 138(1), 65–70 (1986).
[Crossref]

Negres, R. A.

Nomura, H.

M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasui, “Characteristics of indium tin oxide thin films prepared using electron beam evaporation,” Thin Solid Films 447-448, 115–118 (2004).
[Crossref]

Olson, T. Y.

Ostendorf, A.

S. Z. Xiao, E. L. Gurevich, and A. Ostendorf, “Incubation effect and its influence on laser patterning of ITO thin film,” Appl. Phys. Adv. Mater. 107, 333–338 (2012).

Park, S. Y.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Pawlewicz, W. T.

W. T. Pawlewicz, I. B. Mann, W. H. Lowdermilk, and D. Milam, “Laser-Damage-Resistant Transparent Conductive Indium Tin Oxide Coatings,” Appl. Phys. Lett. 34(3), 196–198 (1979).
[Crossref]

Prokert, F.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Radhakrishnan, P.

P. Radhakrishnan, K. Sathianandan, and N. Subhash, “Laser-Induced Damage to Spray Pyrolysis Deposited Transparent Conducting Films,” J. Appl. Phys. 59(3), 902–904 (1986).
[Crossref]

Raman, R. N.

Rogozin, A.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Rosenfeld, A.

A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).

Ryu, M. K.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Sathianandan, K.

P. Radhakrishnan, K. Sathianandan, and N. Subhash, “Laser-Induced Damage to Spray Pyrolysis Deposited Transparent Conducting Films,” J. Appl. Phys. 59(3), 902–904 (1986).
[Crossref]

N. Subhash and K. Sathianandan, “Laser-Induced Damage to Transparent Conducting SnO2 Films at 1062 nm,” J. Appl. Phys. 54(1), 423–424 (1983).
[Crossref]

Scanlan, M.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Seidel, H.

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

Seppala, L.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Shen, N.

Shevchenko, N.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Shinoda, K.

K. Shinoda, T. Nakajima, and T. Tsuchiya, “In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of a low-temperature fabrication process,” Appl. Surf. Sci. 292, 1052–1058 (2014).
[Crossref]

Son, K. S.

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

Spitzer, W. G.

W. G. Spitzer and H. Y. Fan, “Determination of Optical Constants and Carrier Effective Mass of Semiconductors,” Phys. Rev. 106(5), 882–890 (1957).
[Crossref]

Stoian, R.

A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).

Stolz, C.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Straub, M.

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

Subhash, N.

P. Radhakrishnan, K. Sathianandan, and N. Subhash, “Laser-Induced Damage to Spray Pyrolysis Deposited Transparent Conducting Films,” J. Appl. Phys. 59(3), 902–904 (1986).
[Crossref]

N. Subhash and K. Sathianandan, “Laser-Induced Damage to Transparent Conducting SnO2 Films at 1062 nm,” J. Appl. Phys. 54(1), 423–424 (1983).
[Crossref]

Suh, J.

Suratwala, T.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Szorenyi, T.

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
[Crossref]

Tang, W. T.

Thompson, M. O.

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
[Crossref]

Toet, D.

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
[Crossref]

Tse, E.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Tsuchiya, T.

K. Shinoda, T. Nakajima, and T. Tsuchiya, “In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of a low-temperature fabrication process,” Appl. Surf. Sci. 292, 1052–1058 (2014).
[Crossref]

Vinnichenko, M.

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

Wallace, J.

J. Wallace, “Four 800 kW laser-diode arrays to pump high-pulse-rate HAPLS petawatt laser,” Laser Focus World 51, 15–16 (2015).

Walmer, D.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Wang, C.

C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
[Crossref] [PubMed]

C. Wang, H. I. Wang, W. T. Tang, C. W. Luo, T. Kobayashi, and J. Leu, “Superior local conductivity in self-organized nanodots on indium-tin-oxide films induced by femtosecond laser pulses,” Opt. Express 19(24), 24286–24297 (2011).
[Crossref] [PubMed]

Wang, H. F.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Wang, H. I.

C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
[Crossref] [PubMed]

C. Wang, H. I. Wang, W. T. Tang, C. W. Luo, T. Kobayashi, and J. Leu, “Superior local conductivity in self-organized nanodots on indium-tin-oxide films induced by femtosecond laser pulses,” Opt. Express 19(24), 24286–24297 (2011).
[Crossref] [PubMed]

Wang, W. P.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Wegner, P.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Wickboldt, P.

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
[Crossref]

Widmayer, C.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Williams, K.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Wolfe, J.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Wong, N.

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Wrobel, J. M.

J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).

Xiao, S. Z.

S. Z. Xiao, E. L. Gurevich, and A. Ostendorf, “Incubation effect and its influence on laser patterning of ITO thin film,” Appl. Phys. Adv. Mater. 107, 333–338 (2012).

Yamaguchi, M.

M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasui, “Characteristics of indium tin oxide thin films prepared using electron beam evaporation,” Thin Solid Films 447-448, 115–118 (2004).
[Crossref]

Yasui, N.

M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasui, “Characteristics of indium tin oxide thin films prepared using electron beam evaporation,” Thin Solid Films 447-448, 115–118 (2004).
[Crossref]

Yoo, J. H.

Yoshioka, H.

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

Zhang, D. Y.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Zhao, X. J.

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

Appl. Phys. Adv. Mater. (4)

F. O. Adurodija, R. Bruning, I. O. Asia, H. Izumi, T. Ishihara, and H. Yoshioka, “Effects of laser irradiation energy density on the properties of pulsed laser deposited ITO thin films,” Appl. Phys. Adv. Mater. 81, 953–957 (2005).

J. Bonse, J. M. Wrobel, J. Kruger, and W. Kautek, “Ultrashort-pulse laser ablation of indium phosphide in air,” Appl. Phys. Adv. Mater. 72, 89–94 (2001).

A. Rosenfeld, M. Lorenz, R. Stoian, and D. Ashkenasi, “Ultrashort-laser-pulse damage threshold of transparent materials and the role of incubation,” Appl. Phys. Adv. Mater. 69, S373–S376 (1999).

S. Z. Xiao, E. L. Gurevich, and A. Ostendorf, “Incubation effect and its influence on laser patterning of ITO thin film,” Appl. Phys. Adv. Mater. 107, 333–338 (2012).

Appl. Phys. Lett. (4)

C. Wang, H. I. Wang, C. W. Luo, and J. Leu, “Anisotropic optical transmission of femtosecond laser induced periodic surface nanostructures on indium-tin-oxide films,” Appl. Phys. Lett. 101(10), 101911 (2012).
[Crossref] [PubMed]

S. Y. Park, K. H. Ji, H. Y. Jung, J. I. Kim, R. Choi, K. S. Son, M. K. Ryu, S. Lee, and J. K. Jeong, “Improvement in the device performance of tin-doped indium oxide transistor by oxygen high pressure annealing at 150 degrees C,” Appl. Phys. Lett. 100(16), 162108 (2012).
[Crossref]

A. Rogozin, N. Shevchenko, M. Vinnichenko, F. Prokert, V. Cantelli, A. Kolitsch, and W. Moller, “Real-time evolution of the indium tin oxide film properties and structure during annealing in vacuum,” Appl. Phys. Lett. 85(2), 212–214 (2004).
[Crossref]

W. T. Pawlewicz, I. B. Mann, W. H. Lowdermilk, and D. Milam, “Laser-Damage-Resistant Transparent Conductive Indium Tin Oxide Coatings,” Appl. Phys. Lett. 34(3), 196–198 (1979).
[Crossref]

Appl. Surf. Sci. (3)

G. S. Belo, B. J. P. da Silva, E. A. de Vasconcelos, W. M. de Azevedo, and E. F. da Silva., “A simplified reactive thermal evaporation method for indium tin oxide electrodes,” Appl. Surf. Sci. 255(3), 755–757 (2008).
[Crossref]

J. H. Kim, K. A. Jeon, G. H. Kim, and S. Y. Lee, “Electrical, structural, and optical properties of ITO thin films prepared at room temperature by pulsed laser deposition,” Appl. Surf. Sci. 252(13), 4834–4837 (2006).
[Crossref]

K. Shinoda, T. Nakajima, and T. Tsuchiya, “In situ monitoring of excimer laser annealing of tin-doped indium oxide films for the development of a low-temperature fabrication process,” Appl. Surf. Sci. 292, 1052–1058 (2014).
[Crossref]

J. Appl. Phys. (6)

H. F. Wang, Z. M. Huang, D. Y. Zhang, F. Luo, L. X. Huang, Y. L. Li, Y. Q. Luo, W. P. Wang, and X. J. Zhao, “Thickness effect on laser-induced-damage threshold of indium-tin oxide films at 1064 nm,” J. Appl. Phys. 110(11), 113111 (2011).
[Crossref]

H. Han, J. W. Mayer, and T. L. Alford, “Band gap shift in the indium-tin-oxide films on polyethylene napthalate after thermal annealing in air,” J. Appl. Phys. 100(8), 083715 (2006).
[Crossref]

T. Szorenyi, L. D. Laude, I. Bertoti, Z. Kantor, and Z. Geretovszky, “Excimer-Laser Processing of Indium-Tin-Oxide Films - an Optical Investigation,” J. Appl. Phys. 78(10), 6211–6219 (1995).
[Crossref]

A. Ben-Yakar and R. L. Byer, “Femtosecond laser ablation properties of borosilicate glass,” J. Appl. Phys. 96(9), 5316–5323 (2004).
[Crossref]

N. Subhash and K. Sathianandan, “Laser-Induced Damage to Transparent Conducting SnO2 Films at 1062 nm,” J. Appl. Phys. 54(1), 423–424 (1983).
[Crossref]

P. Radhakrishnan, K. Sathianandan, and N. Subhash, “Laser-Induced Damage to Spray Pyrolysis Deposited Transparent Conducting Films,” J. Appl. Phys. 59(3), 902–904 (1986).
[Crossref]

Laser Focus World (1)

J. Wallace, “Four 800 kW laser-diode arrays to pump high-pulse-rate HAPLS petawatt laser,” Laser Focus World 51, 15–16 (2015).

Nat. Photonics (1)

K. Ellmer, “Past achievements and future challenges in the development of optically transparent electrodes,” Nat. Photonics 6(12), 809–816 (2012).
[Crossref]

Opt. Express (2)

Opt. Lett. (1)

Opt. Mater. Express (1)

Phys. Rev. (1)

W. G. Spitzer and H. Y. Fan, “Determination of Optical Constants and Carrier Effective Mass of Semiconductors,” Phys. Rev. 106(5), 882–890 (1957).
[Crossref]

Proc. SPIE (2)

M. Klotzer, M. Afshar, D. Feili, H. Seidel, K. Konig, and M. Straub, “Generation of laser-induced periodic surface structures in indium-tin-oxide thin films and two-photon lithography of ma-N photoresist by sub-15 femtosecond laser microscopy for liquid crystal cell application,” Proc. SPIE 9351, 935110 (2015).

J. Heebner, M. Borden, P. Miller, C. Stolz, T. Suratwala, P. Wegner, M. Hermann, M. Henesian, C. Haynam, S. Hunter, K. Christensen, N. Wong, L. Seppala, G. Brunton, E. Tse, A. Awwal, M. Franks, E. Marley, K. Williams, M. Scanlan, T. Budge, M. Monticelli, D. Walmer, S. Dixit, C. Widmayer, J. Wolfe, J. Bude, K. McCarty, and J. M. DiNicola, “A programmable beam shaping system for tailoring the profile of high fluence laser beams,” Proc. SPIE 7842, 78421C (2010).
[Crossref]

Semicond. Sci. Technol. (1)

T. Minami, “Transparent conducting oxide semiconductors for transparent electrodes,” Semicond. Sci. Technol. 20(4), S35–S44 (2005).
[Crossref]

Thin Solid Films (6)

S. Naseem and T. J. Coutts, “The Influence of Deposition Parameters on the Optical and Electrical-Properties of Rf-Sputter-Deposited Indium Tin Oxide-Films,” Thin Solid Films 138(1), 65–70 (1986).
[Crossref]

P. C. Karulkar and M. E. Mccoy, “Dc Magnetron Sputter Deposition of Indium Tin Oxide-Films,” Thin Solid Films 83(2), 259–260 (1981).
[Crossref]

M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasui, “Characteristics of indium tin oxide thin films prepared using electron beam evaporation,” Thin Solid Films 447-448, 115–118 (2004).
[Crossref]

C. G. Granqvist and A. Hultaker, “Transparent and conducting ITO films: new developments and applications,” Thin Solid Films 411(1), 1–5 (2002).
[Crossref]

M. J. Alam and D. C. Cameron, “Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process,” Thin Solid Films 377-378, 455–459 (2000).
[Crossref]

W. Chung, M. O. Thompson, P. Wickboldt, D. Toet, and P. G. Carey, “Room temperature indium tin oxide by XeCl excimer laser annealing for flexible display,” Thin Solid Films 460(1-2), 291–294 (2004).
[Crossref]

Other (1)

C. Wolfe, M. Kozlowski, J. Campbell, M. Staggs, and F. Rainer, “Permanent laser conditioning of thin film optical materials,” US Patent, 5472748 A (1995).

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Figures (5)

Fig. 1
Fig. 1 (a) Schematics of nanosecond (ns) laser damage system integrated with in situ reflectance monitoring using co-incident beams with a pulsed 1064 nm pump laser (4.7 ns pulse width) and a 532 nm (green, continuous wave) probe laser. The electrical and optical properties of the ITO film were monitored while the film was exposed to ns laser irradiation. (b) Schematics of ITO channel structure for electric property measurements. (c) Microscope image from in situ camera. The green probe laser beam is displayed over a damage site produced by the ns laser pulse.
Fig. 2
Fig. 2 (a-d) Optical micrographs of laser-induced damage sites for a range of laser fluences (F) and pulse numbers of exposure (N). All images have the same scale bar of 20 μm. (a) The region in the dashed box is shown at higher magnification in the inset. The scale bar in the inset is 5 μm. (e) The damage depth profiles along the dashed lines in (a-d) are shown in green, red, blue, and black, respectively.
Fig. 3
Fig. 3 The square of the damage site diameters is plotted as a function of (a) the laser fluence and (b) the number of pulses (N) on a semi-log scale for N = 1, 5, 25, 125, 625, and 3125. (c) Estimated laser ablation threshold as a function of the number of pulses on a semi-log scale.
Fig. 4
Fig. 4 Electrical resistance of ITO film under ns laser irradiation at fluences of 0.8, 1.0, 1.2, 1.4, 1.6, and 1.8 J/cm2. The dashed box indicates the time frame of laser irradiation. (a) Transient response of electrical resistance (R) from ITO channel structure. The left inset shows the 200 µm ITO channel structure that was damaged during the measurement at 1.8 J/cm2. The right inset shows a magnified graph before the resistance increase at 1.8 J/cm2 due to the damage. (b) Transient response of electrical resistance change (∆R/Ro) under laser irradiation at 0.8 – 1.6 J/cm2. Note, 0.02% offsets were applied to each plot to avoid overlapping graphs.
Fig. 5
Fig. 5 Optical reflectance of ITO film under ns laser irradiation. (a) In situ camera snapshots of ITO film surface upon multi-pulse exposures at a laser fluence of 2.0 J/cm2. The elapsed time of each snapshot is presented in the left top corner. All images have the same scale, where the scale bars are 50 μm. The inset in the 104 s image shows first observable damage with 3 × magnification. (b) Reflected intensity at 532 nm of two separate runs at 2.0 J/cm2. The black dots in the snapshots in (a) indicate the probe beam location for the reflection intensity measurement. (c) Magnified reflection intensity change at fluences of 0.5, 1.0, 1.5, and 2.0 J/cm2. The irradiation time was from 100 to 400 s. Note, 0.75% offsets were applied to each plot to avoid overlapping graphs.

Equations (3)

Equations on this page are rendered with MathJax. Learn more.

F( r )= F peak exp( 2 r 2 w o 2 )
D 2 =2 w o 2 ln( F peak F th )
F th ( N )= F th ( )+[ F th (1) F th ( ) ]exp[ k(N1) ],

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