Y. Xing, U. Khan, A. R. Alves Júnior, and W. Bogaerts, “Behavior model for directional coupler,” in Proceedings Symposium IEEE Photonics Society Benelux, (2017), pp. 128–131.

A. Auger and N. Hansen, “A restart cma evolution strategy with increasing population size,” in Evolutionary Computation, 2005. The 2005 IEEE Congress on, vol. 2 (IEEE, 2005), pp. 1769–1776.

Y. Li, D. Vermeulen, Y. De Koninck, G. Yurtsever, G. Roelkens, and R. Baets, “Compact grating couplers on silicon-on-insulator with reduced backreflection,” Opt. Lett. 37(21), 4356–4358 (2012).

[Crossref]

S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 316–324 (2010).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

M. Fiers, T. Van Vaerenbergh, K. Caluwaerts, D. Vande Ginste, B. Schrauwen, J. Dambre, and P. Bienstman, “Time-domain and frequency-domain modeling of nonlinear optical components at the circuit-level using a node-based approach,” J. Opt. Soc. Am. B 29(5), 896 (2012).

[Crossref]

Y. Xing, J. Dong, S. Dwivedi, U. Khan, and W. Bogaerts, “Accurate extraction of fabricated geometry using optical measurement,” Photonics Res. 6(11), 1008 (2018).

[Crossref]

W. Bogaerts and L. Chrostowski, “Silicon Photonics Circuit Design: Methods, Tools and Challenges,” Laser Photonics Rev. 12(4), 1700237 (2018).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 316–324 (2010).

[Crossref]

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical model for spatial variations of integrated photonics,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

W. Bogaerts, U. Khan, and Y. Xing, “Layout-aware yield prediction of photonic circuits,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

Y. Xing, U. Khan, A. R. Alves Júnior, and W. Bogaerts, “Behavior model for directional coupler,” in Proceedings Symposium IEEE Photonics Society Benelux, (2017), pp. 128–131.

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical Model for Spatial Variations of Integrated Photonics,” in IEEE International Conference on Group IV Photonics, (OSA, Cancun, Mexico, 2018).

W. Bogaerts and L. Chrostowski, “Silicon Photonics Circuit Design: Methods, Tools and Challenges,” Laser Photonics Rev. 12(4), 1700237 (2018).

[Crossref]

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

T. W. Weng, D. Melati, A. I. Melloni, and L. Daniel, “Stochastic simulation and robust design optimization of integrated photonic filters,” Nanophotonics 6(1), 299–308 (2017).

[Crossref]

Y. Xing, J. Dong, S. Dwivedi, U. Khan, and W. Bogaerts, “Accurate extraction of fabricated geometry using optical measurement,” Photonics Res. 6(11), 1008 (2018).

[Crossref]

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical model for spatial variations of integrated photonics,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical Model for Spatial Variations of Integrated Photonics,” in IEEE International Conference on Group IV Photonics, (OSA, Cancun, Mexico, 2018).

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 316–324 (2010).

[Crossref]

Y. Xing, J. Dong, S. Dwivedi, U. Khan, and W. Bogaerts, “Accurate extraction of fabricated geometry using optical measurement,” Photonics Res. 6(11), 1008 (2018).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

N. Hansen, “The cma evolution strategy: A tutorial,” arXiv preprint arXiv:1604.00772 (2016).

A. Auger and N. Hansen, “A restart cma evolution strategy with increasing population size,” in Evolutionary Computation, 2005. The 2005 IEEE Congress on, vol. 2 (IEEE, 2005), pp. 1769–1776.

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

Y. Xing, J. Dong, S. Dwivedi, U. Khan, and W. Bogaerts, “Accurate extraction of fabricated geometry using optical measurement,” Photonics Res. 6(11), 1008 (2018).

[Crossref]

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical model for spatial variations of integrated photonics,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

W. Bogaerts, U. Khan, and Y. Xing, “Layout-aware yield prediction of photonic circuits,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical Model for Spatial Variations of Integrated Photonics,” in IEEE International Conference on Group IV Photonics, (OSA, Cancun, Mexico, 2018).

Y. Xing, U. Khan, A. R. Alves Júnior, and W. Bogaerts, “Behavior model for directional coupler,” in Proceedings Symposium IEEE Photonics Society Benelux, (2017), pp. 128–131.

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

T. W. Weng, D. Melati, A. I. Melloni, and L. Daniel, “Stochastic simulation and robust design optimization of integrated photonic filters,” Nanophotonics 6(1), 299–308 (2017).

[Crossref]

T. W. Weng, D. Melati, A. I. Melloni, and L. Daniel, “Stochastic simulation and robust design optimization of integrated photonic filters,” Nanophotonics 6(1), 299–308 (2017).

[Crossref]

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 316–324 (2010).

[Crossref]

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).

S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 316–324 (2010).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

M. Fiers, T. Van Vaerenbergh, K. Caluwaerts, D. Vande Ginste, B. Schrauwen, J. Dambre, and P. Bienstman, “Time-domain and frequency-domain modeling of nonlinear optical components at the circuit-level using a node-based approach,” J. Opt. Soc. Am. B 29(5), 896 (2012).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

T. W. Weng, D. Melati, A. I. Melloni, and L. Daniel, “Stochastic simulation and robust design optimization of integrated photonic filters,” Nanophotonics 6(1), 299–308 (2017).

[Crossref]

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

Y. Xing, J. Dong, S. Dwivedi, U. Khan, and W. Bogaerts, “Accurate extraction of fabricated geometry using optical measurement,” Photonics Res. 6(11), 1008 (2018).

[Crossref]

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical model for spatial variations of integrated photonics,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

W. Bogaerts, U. Khan, and Y. Xing, “Layout-aware yield prediction of photonic circuits,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

Y. Xing, U. Khan, A. R. Alves Júnior, and W. Bogaerts, “Behavior model for directional coupler,” in Proceedings Symposium IEEE Photonics Society Benelux, (2017), pp. 128–131.

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical Model for Spatial Variations of Integrated Photonics,” in IEEE International Conference on Group IV Photonics, (OSA, Cancun, Mexico, 2018).

S. Selvaraja, W. Bogaerts, P. Dumon, D. Van Thourhout, and R. Baets, “Subnanometer Linewidth Uniformity in Silicon Nanophotonic Waveguide Devices Using CMOS Fabrication Technology,” IEEE J. Sel. Top. Quantum Electron. 16(1), 316–324 (2010).

[Crossref]

S. Dwivedi, A. Ruocco, M. Vanslembrouck, T. Spuesens, P. Bienstman, P. Dumon, T. Van Vaerenbergh, and W. Bogaerts, “Experimental Extraction of Effective Refractive Index and Thermo-Optic Coefficients of Silicon-on-Insulator Waveguides Using Interferometers,” J. Lightwave Technol. 33(21), 4471–4477 (2015).

[Crossref]

W. Bogaerts and L. Chrostowski, “Silicon Photonics Circuit Design: Methods, Tools and Challenges,” Laser Photonics Rev. 12(4), 1700237 (2018).

[Crossref]

T. W. Weng, D. Melati, A. I. Melloni, and L. Daniel, “Stochastic simulation and robust design optimization of integrated photonic filters,” Nanophotonics 6(1), 299–308 (2017).

[Crossref]

Z. Lu, J. Jhoja, J. Klein, X. Wang, A. Liu, J. Flueckiger, J. Pond, and L. Chrostowski, “Performance prediction for silicon photonics integrated circuits with layout-dependent correlated manufacturing variability,” Opt. Express 25(9), 9712 (2017).

[Crossref]

W. A. Zortman, D. C. Trotter, and M. R. Watts, “Silicon photonics manufacturing,” Opt. Express 18(23), 23598 (2010).

[Crossref]

Y. Xing, J. Dong, S. Dwivedi, U. Khan, and W. Bogaerts, “Accurate extraction of fabricated geometry using optical measurement,” Photonics Res. 6(11), 1008 (2018).

[Crossref]

Y. Xing, U. Khan, A. R. Alves Júnior, and W. Bogaerts, “Behavior model for directional coupler,” in Proceedings Symposium IEEE Photonics Society Benelux, (2017), pp. 128–131.

L. Chrostowski, X. Wang, J. Flueckiger, Y. Wu, Y. Wang, and S. T. Fard, “Impact of fabrication non-uniformity on chip-scale silicon photonic integrated circuits,” in Conference on Optical Fiber Communication, Technical Digest Series, (OSA, 2014), pp. Th2A–37.

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical Model for Spatial Variations of Integrated Photonics,” in IEEE International Conference on Group IV Photonics, (OSA, Cancun, Mexico, 2018).

N. Hansen, “The cma evolution strategy: A tutorial,” arXiv preprint arXiv:1604.00772 (2016).

“The CMA Evolution Strategy,” http://cma.gforge.inria.fr/ . Accessed: 2019-02-14.

A. Auger and N. Hansen, “A restart cma evolution strategy with increasing population size,” in Evolutionary Computation, 2005. The 2005 IEEE Congress on, vol. 2 (IEEE, 2005), pp. 1769–1776.

Y. Xing, J. Dong, U. Khan, and W. Bogaerts, “Hierarchical model for spatial variations of integrated photonics,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

W. Bogaerts, U. Khan, and Y. Xing, “Layout-aware yield prediction of photonic circuits,” in 2018 IEEE 15th International Conference on Group IV Photonics (GFP), (IEEE, 2018), pp. 1–2.

T. Horikawa, D. Shimura, H. Takahashi, J. Ushida, Y. Sobu, A. Shiina, M. Tokushima, S. H. Jeong, K. Kinoshita, and T. Mogami, “Extraction of SOI thickness deviation based on resonant wavelength analysis for silicon photonics devices,” in 2017 IEEE SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), (IEEE, 2017).